Image analysis – Applications – Manufacturing or product inspection
Patent
1997-03-11
1999-09-07
Tran, Phuoc
Image analysis
Applications
Manufacturing or product inspection
382141, 382144, 382147, 382149, 348126, G06K 900, H04N 718
Patent
active
059499001
ABSTRACT:
In a fine pattern inspection device for inspecting a fine pattern comprising a plurality of pattern elements which have the same form and which are formed on an inspection sample, the device detects a defect in the plurality of pattern elements by the use of an image derived from the fine pattern. An image obtaining unit obtains the image from the fine pattern and produces an image signal representing the image. The image signal is divided into first and second divided image signals. A processing unit extracts a defect image and an inverted defect image that is inverted in lightness of the defect image, by carrying out a first process that gives a predetermined delay to the first divided image signal and then inverts the lightness thereof to obtain a processed image signal and carrying out a second process that adds the processed image signal and the second divided image signal to obtain a difference image signal representing a difference image which includes the defect image and the inverted defect image. A display device displays the defect image and the inverted defect image.
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Komatsu Yoshikazu
Nakamura Toyokazu
Mariam Daniel G.
NEC Corporation
Tran Phuoc
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