Fine pattern forming method and stamper

Details Fine pattern forming method and stamper Fine pattern forming method and stamper

2011-03-01

2011-03-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S394000

Reexamination Certificate

active

07897301

ABSTRACT:
A technique for forming fine patterns by a simple method. A fine pattern forming method includes a step of forming a heat-resist film on a substrate, applying energy to regions of the resist film to form a fine pattern, and thereafter developing the resist film. The material used to form the resist film is a metal oxide of a composition that differs from a stoichiometric composition by lacking a small amount of oxygen, the energy is applied to the resist film using pressure, and the resist film is developed using an alkaline developer.

REFERENCES:
patent: 2005/0226999 (2005-10-01), Kouchiyama et al.
patent: 2007/0037092 (2007-02-01), Konishi et al.
patent: 2005-203052 (2005-07-01), None
patent: 2007-72374 (2007-03-01), None

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