Fine line thick film resistors by photolithography

Details Fine line thick film resistors by photolithography Fine line thick film resistors by photolithography

2007-05-29

2007-05-29

Hoang, Tu (Department: 2832)

Electrical resistors

With base extending along resistance element

Resistance element and/or terminals printed or marked on base

C338S195000

Reexamination Certificate

active

10950612

ABSTRACT:
The present invention is directed to a thick film patterned resistor on a substrate and to a method of forming it. The method involves providing a substrate with opposed surfaces, where one surface is coated with a layer of a resistor composition. A photoresist is applied over the layer of the resistor composition, and a desired pattern in the photoresist is formed, where the pattern leaves certain regions of the resistor composition layer uncovered by the photoresist. The resistor composition layer which is uncovered by the photoresist is etched under conditions effective to leave a mass of loosely bound resistor particles at regions of the resistor composition which are not covered by photoresist. The mass of resistor particles is then removed from the substrate to produce a thick film patterned resistor on the substrate.

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