Fine line scribing of conductive material

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2041293, 156643, C25F 312, C25F 314, B44C 122

Patent

active

051494043

ABSTRACT:
Fine lines (approximately 3 microns or less) are patternable on conductive materials by electromachining techniques. These micro-techniques differ from conventional electromachining in that the linewidth is primarily determined by the characteristics of the electric field rather than the electrode geometry.

REFERENCES:
patent: 3436516 (1969-04-01), Swift
patent: 4283259 (1981-08-01), Melcher
patent: 4306951 (1981-12-01), Depp et al.
patent: 4330788 (1982-05-01), Hinz et al.
patent: 4425496 (1984-01-01), Le Fur et al.
patent: 4634826 (1987-01-01), Solomon et al.
patent: 4931613 (1990-06-01), Salsgiver et al.
G. Albrecht-Buehler, "The Angular Distribution of Directional Changes of Guided 3T3 Cells," J. Cell Biology, vol. 80, pp. 53-60 (1979).
A. C. Hardy, et al The Principles of Optics, p. 563, McGraw-Hill (1932).
Japanese Patent App. 982-33922, Filed Feb. 24, 1982, Sato et al.
J. P. Ibe, et al, J. of Vacuum Science and Technology A, 4, p. 3510 (1990).
A. L. Livshits, Electro-Erosion Machining of Metals, p. 1, Butterworths, London (1960).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fine line scribing of conductive material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fine line scribing of conductive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fine line scribing of conductive material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1066063

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.