Fine circuit pattern drawing apparatus and method

Details Fine circuit pattern drawing apparatus and method Fine circuit pattern drawing apparatus and method

1986-12-29

1989-03-07

Fields, Carolyn E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504911, G21K 510

Patent

active

048108898

ABSTRACT:
An apparatus for drawing a fine circuit pattern on a wafer, includes a radiation beam generating head for generating and emitting radiation beams with which the wafer is to be patternwisely exposed; a first moving system for moving the beam generating head in a first direction; and a second moving system for moving the wafer at least in a second direction, substantially perpendicular to the first direction, while holding the wafer by attraction.

REFERENCES:
patent: 4325084 (1982-04-01), van Gorkom et al.
patent: 4489241 (1984-12-01), Matsuda et al.
patent: 4538069 (1985-08-01), Shambroom et al.
patent: 4740705 (1988-04-01), Crewe

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