Final rinse/dry system for critical cleaning applications

Details Final rinse/dry system for critical cleaning applications Final rinse/dry system for critical cleaning applications

1993-04-02

1995-05-30

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134 961, 134 981, 134 991, 134105, 134113, 134902, B08B 304

Patent

active

054193516

ABSTRACT:
A final rinse/dry system for critical cleaning applications is provided having an ultrafiltration unit for providing an ultrapurified liquid to a holding chamber. A liquid conduit assembly connects the ultrafiltration unit to the holding chamber and controls the flow of the ultrapurified liquid therethrough. A liquid discharge assembly is connected to the liquid conduit assembly to selectively drain liquid from the holding chamber and the liquid conduit assembly. An inert gas conduit assembly provides the holding chamber with an inert atmosphere during drying, and a purge assembly is connected to the inert gas conduit assembly to bleed inert gas through the purge assembly to prevent contaminant build-up in the inert gas conduit assembly during the non-operating time thereof.

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The Effects of Iron Contamination on Thin Oxide Breakdown--Experimental and Modeling; W. B. Henley, L. Jastrzebski, and N. Haddad; Florida Institute of Technology; Jul., 1992.
Clean Water for Critical Processes; Ultrafiltration System; S&K Products International, Inc.
Fluoroware; Processing and Handling Products for the Semiconductor Industry; 1988-1989.
The Segregation and Removal of Metallic Impurities at the Interface of Silicon Wafer Surface and Liquid Chemicals Takashi Imaoka, Takehiko Kezuka, Jun Takano, Isamu Sugiyama, Tadahiro Ohmi; Jul. 1992.

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