Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate
2007-12-11
2007-12-11
Zarneke, David A. (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
C257SE23173
Reexamination Certificate
active
10847901
ABSTRACT:
A semiconductor device includes a substrate with an active area. A last level interconnect capping layer is disposed over the active area. A buffer layer/crack stop layer overlies the last level interconnect capping layer and a passivation layer overlies the buffer layer/crack stop layer. Also, a contact pad (e.g., probe pad, wire bond pad or flip-chip pad) overlies the passivation layer.
REFERENCES:
patent: 6265780 (2001-07-01), Yew et al.
patent: 6713873 (2004-03-01), O'Loughlin et al.
patent: 6774059 (2004-08-01), Chuang et al.
patent: 6798043 (2004-09-01), Steiner et al.
patent: 6849536 (2005-02-01), Lee et al.
patent: 6949830 (2005-09-01), Owada et al.
patent: 7005752 (2006-02-01), Bojkov et al.
patent: 2002/0014705 (2002-02-01), Ishio et al.
Kaltalioglu Erdem
Pils Christian
Infineon - Technologies AG
Slater & Matsil L.L.P.
Zarneke David A.
LandOfFree
Final passivation scheme for integrated circuits does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Final passivation scheme for integrated circuits, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Final passivation scheme for integrated circuits will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3896779