Fin-type antifuse

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Non-single crystal – or recrystallized – active junction...

Reexamination Certificate

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C257S530000

Reexamination Certificate

active

07456426

ABSTRACT:
A method of forming an antifuse forms a material layer and then patterns the material layer into a fin. The center portion of the fin is converted into a substantially non-conductive region and the end portions of the fin into conductors. The process of converting the center portion of the fin into an insulator allows a process of heating the fin above a predetermined temperature to convert the insulator into a conductor. Thus, the fin-type structure that can be selectively converted from an insulator into a permanent conductor using a heating process.

REFERENCES:
patent: 5095362 (1992-03-01), Roesner
patent: 5166556 (1992-11-01), Hsu et al.
patent: 5469379 (1995-11-01), Levy
patent: 5502395 (1996-03-01), Allen
patent: 5899707 (1999-05-01), Sanchez et al.
patent: 2002/0063305 (2002-05-01), Koike
patent: 2002/0105452 (2002-08-01), Clapp et al.
patent: 2002/0140051 (2002-10-01), Knall et al.
patent: 2003/0132504 (2003-07-01), Bertin et al.

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