Fin for use in a semiconductor wafer heat processing apparatus

Equipment for production – distribution – or transformation of ene – Distribution – modification or control – Semiconductor – transistor or integrated circuit

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1303

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D04043731

REFERENCES:
patent: 4857689 (1989-08-01), Lee
patent: 5314574 (1994-05-01), Takahashi
patent: 5320218 (1994-06-01), Yamashita et al.
patent: 5752796 (1998-05-01), Muka

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