Filtration system to remove photoresist film particles

Details Filtration system to remove photoresist film particles Filtration system to remove photoresist film particles

1990-10-23

1993-01-12

Theisen, Mary Lynn

Liquid purification or separation

Filter

Movable medium

210394, 210407, 2104161, B01D 3306

Patent

active

051787598

ABSTRACT:
A method for removing a liquid stripper composition from a slurry comprised of the liquid stripper composition and of photoresist film particles which were removed from a circuit board substrate by using the liquid stripper composition. The slurry flows over the inner surface of the porous wall of a drum under gravity to form a generally uniform layer on the inner surface of the drum. Liquid escapes from the slurry through the porous wall of the drum.

REFERENCES:
patent: 1453311 (1923-05-01), Engel, Sr.
patent: 2083887 (1937-06-01), Wieneke
patent: 3401654 (1968-09-01), Reichert et al.
patent: 4137177 (1979-01-01), Shoda
patent: 4236999 (1980-02-01), Burgess et al.
patent: 4248709 (1981-02-01), Kruing
patent: 4358369 (1982-11-01), Matula et al.
patent: 4371422 (1983-02-01), Eidschun
patent: 4692248 (1987-09-01), Stannard et al.

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