Filtering technique for CVD chamber process gases

Details Filtering technique for CVD chamber process gases Filtering technique for CVD chamber process gases

1995-02-17

1997-10-28

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

4272551, 427444, 95287, C23C 1602

Patent

active

056816138

ABSTRACT:
A method for filtering process gases prior to said process gases being allowed to enter a CVD chamber is provided in order to ensure high purity of the process gases. In one embodiment, the process gases are filtered with a first filter located in a first section of a gas line being isolated by valves at both ends of the gas line section. Further filtering by a second filter occurs in a downstream gas line section.

REFERENCES:
patent: 1455116 (1923-05-01), Lumley
patent: 3493431 (1970-02-01), Wagner
patent: 4220460 (1980-09-01), Partus
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 5123375 (1992-06-01), Hansen

Affiliated with

Also associated with

Rating

Filtering technique for CVD chamber process gases does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Filtering technique for CVD chamber process gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Filtering technique for CVD chamber process gases will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1024636