Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1992-07-30
1994-01-18
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20429841, 250426, 313153, 313157, 427580, C23C 1432
Patent
active
052797236
ABSTRACT:
A continuous, cathodic arc ion source coupled to a macro-particle filter capable of separation or elimination of macro-particles from the ion flux produced by cathodic arc discharge. The ion source employs an axial magnetic field on a cathode (target) having tapered sides to confine the arc, thereby providing high target material utilization. A bent magnetic field is used to guide the metal ions from the target to the part to be coated. The macro-particle filter consists of two straight solenoids, end to end, but placed at 45.degree. to one another, which prevents line-of-sight from the arc spot on the target to the parts to be coated, yet provides a path for ions and electrons to flow, and includes a series of baffles for trapping the macro-particles.
REFERENCES:
patent: 2724058 (1955-11-01), Frankel
patent: 2777958 (1957-01-01), LePoole
patent: 2906879 (1959-09-01), Glaser
patent: 2972695 (1961-02-01), Wroe
patent: 3376414 (1968-04-01), Bell, Jr. et al.
patent: 3625848 (1971-12-01), Snaper
patent: 4180450 (1979-12-01), Morrison, Jr.
patent: 4204936 (1980-05-01), Hartsough
patent: 4221652 (1980-09-01), Kuriyama
patent: 4452686 (1984-06-01), Axenov et al.
patent: 4544468 (1985-10-01), Munz et al.
patent: 4587432 (1986-05-01), Aitken
patent: 4634931 (1987-01-01), Taya et al.
patent: 4649278 (1987-03-01), Chutjian et al.
patent: 4766320 (1988-08-01), Naitoh et al.
patent: 4824544 (1989-04-01), Mikalesen et al.
patent: 4855033 (1989-08-01), Hurwitt
patent: 4892633 (1990-01-01), Welty
patent: 5078848 (1992-01-01), Anttila et al.
patent: 5126030 (1992-06-01), Tamagaki et al.
I. I. Aksenov et al., Transport of Plasma Streams in a Curvilinear Plasma-Optics System, Sov. J. Plasma Phys. 4(4), Jul.-Aug. 1978, 425-428.
D. M. Sanders, Review of Ion-Based Coating Processes Derived from the Cathodic Arc, J. Vac. Sci. Technol. A7 (3), Mar.-Jun. 1989, 2339-2345.
D. M. Sanders et al., Coating Technology Based on the Vacuum Arc-A Review, IEEE Trans. On Plasma Science, vol. 18, No. 6, Dec. 1990, 883-894.
D. M. Sanders et al., Coatings from Ions-Modeling and Experiments, UCRL-53868-90, Manuscript Date: Aug. 1991, 4-14 to 4-18.
S. Falabella et al., Comparison of Two Filtered Cathodic Arc Sources, J. Vac. Sci., Technol. A (10(2), Mar./Apr. 1992, 394-397.
Falabella Steven
Sanders David M.
as represented by the United States Department of Energy
Gaither Roger S.
Moser William R.
Sartorio Henry P.
Weisstuch Aaron
LandOfFree
Filtered cathodic arc source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Filtered cathodic arc source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Filtered cathodic arc source will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1134231