Filter system for semiconductor furnace

Details Filter system for semiconductor furnace Filter system for semiconductor furnace

1996-01-11

1998-07-21

Smith, Duane S.

Gas separation

With separating media bypass or system gas pressure relief

Valved bypass means

553851, 438795, 438799, 438909, B01D 4600

Patent

active

057829420

ABSTRACT:
An improved filter system, particularly for the furnaces of a semiconductor manufacturing plant, has a standby filter and a piping system for connecting it momentarily in parallel with a normally used filter of one of the furnaces. A system of valves permits the normal filter to be isolated from its furnace so that it can be allowed to cool and then removed and replaced. The filter system avoids the problem that a standby filter is otherwise required for each furnace or that the replacement can not be made at a convenient time.

REFERENCES:
patent: 4717472 (1988-01-01), Oberg
patent: 4906257 (1990-03-01), Fukunaga et al.
patent: 4940213 (1990-07-01), Ohmine et al.
patent: 5088922 (1992-02-01), Kakizaki et al.
patent: 5131931 (1992-07-01), Miley et al.
patent: 5227334 (1993-07-01), Sandhu
patent: 5250092 (1993-10-01), Nakano
patent: 5514196 (1996-05-01), Tanahashi et al.

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