Filter system for light source

Details Filter system for light source Filter system for light source

2011-01-18

2011-01-18

Glick, Edward J (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S071000, C355S067000

Reexamination Certificate

active

07872729

ABSTRACT:
The invention is concerned with a filter system for a light source in a lithography process for the production of semiconductor devices with a flowing absorber gas for at least one wavelength (λ) in the range between 20 to 250 nm, the flowing absorber gas intersecting the light path emitted by the light source. Furthermore, the invention is concerned with a lithography apparatus for processing semiconductor substrates, the use of a filter system, a method for filtering light and a semiconductor device manufactured by the method.

REFERENCES:
patent: 2003/0006383 (2003-01-01), Melnychuk et al.
patent: 2003/0142280 (2003-07-01), Bakker et al.
patent: 2004/0013226 (2004-01-01), Bakker et al.
patent: 2005/0254029 (2005-11-01), Banine et al.
patent: 2006/0012761 (2006-01-01), Bakker et al.
patent: 2007/0145297 (2007-06-01), Freriks et al.
Fan, Yu-Jen, “Out of Band Filtering Properties of Projection Optics,” 12 pages.
Keller-Rudek, et al. “MPI-Mainz-UV-VIS Spectral Atlas of Gaseous Molecules.” [on-line] downloaded Jan. 23, 2007 www.atmosphere.mpg.de/spectral-atlas-mainz, 3 pages.

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