X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1993-05-07
1995-02-28
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 88, 378156, G01N 23203
Patent
active
053944542
ABSTRACT:
A filter method and device for carrying out the method in conjunction with an X-ray system having a beam path for primary radiation between an X-ray source and an examination zone and a beam path for scattered radiation between the examination zone and a detector device, involve subtractive combination of first and second measurement signals produced by the detector device in response to scattered radiation received in first and second filter arrangements. For production of the first measurement signal a filter is arranged in the beam path for primary radiation and not in the beam path for scattered radiation, while for production of the second measurement signal a filter is arranged in the beam path for scattered radiation and not in the beam path for primary radiation. The latter filter consists of the same material as the filter used for the first measurement, and may be the same filter.
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Porta David P.
Slobod Jack D.
U.S. Philips Corporation
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