Gas separation – Combined or convertible – In environmental air enclosure
Reexamination Certificate
2005-08-16
2005-08-16
Hopkins, Robert A. (Department: 1724)
Gas separation
Combined or convertible
In environmental air enclosure
C055S524000, C055SDIG005
Reexamination Certificate
active
06929672
ABSTRACT:
The present invention has as its object to provide an air filter not only for trapping suspended particulate substances but also for not generating hazardous contaminates in the air, which cause trouble in the manufacture of semiconductor devices. As a binder to bind fibers of the air filter together, a polymer dispersion is used in which a copolymer of a hydrophilic monomer and a hydrophobic monomer is dispersed in water. As an initiator for polymerization of the copolymer, an organic peroxide is used. When an air filter (8) is installed downstream of a chemical filter (7), the space (4) placed downstream of the air filter (8) is made substantially free of organic substances and/or inorganic substances that cause trouble in the manufacture of semiconductor devices.
REFERENCES:
patent: 3944690 (1976-03-01), Distler et al.
patent: 4291087 (1981-09-01), Warburton, Jr.
patent: 4859527 (1989-08-01), DiStefano
patent: 5514196 (1996-05-01), Tanahashi et al.
patent: 06142439 (1994-05-01), None
patent: A-9-29020 (1997-02-01), None
patent: A97/187612 (1997-07-01), None
patent: WO97/04851 (1997-02-01), None
Kobayashi Sadao
Matsuno Keiji
Sugiyama Satoki
Takizawa Seiichi
Wakayama Yoshihide
Cambridge Filter Japan, Ltd.
Hopkins Robert A.
Kondoh Industries, Ltd.
Taisei Corporation
Young & Basile P.C.
LandOfFree
Filter medium for air filter and process for producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Filter medium for air filter and process for producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Filter medium for air filter and process for producing the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3463239