Surgery – Respiratory method or device – Means for removing substance from respiratory gas
Reexamination Certificate
2006-05-02
2006-05-02
Bennett, Henry (Department: 3743)
Surgery
Respiratory method or device
Means for removing substance from respiratory gas
C128S205290, C128S206120, C128S206130
Reexamination Certificate
active
07036507
ABSTRACT:
The invention provides a filter mask for filtering air inhaled and exhaled from the mouth and nostrils while providing a positive facial lock at all edges of the mask. The filter mask has upper and lower edges which are provided with malleable stiffeners for conforming to the shape of the wearer's nose and cheek area and the lower jaw and chin area, respectively. The material of the filter mask is folded to have an omega pleat for forming a breathing chamber and a secondary pleat for assisting in securing the mask to the lower jaw and chin area. A pair of headbands are used to hold the mask on the head. The peripheral edges of the mask are bound. The mask provides excellent filtration since the positive facial lock around all edges of the mask substantially prevents air from leaking between the mask and the face.
REFERENCES:
patent: 2752916 (1956-07-01), Haliczer
patent: 3603315 (1971-09-01), Becker, III
patent: 3971369 (1976-07-01), Aspelin et al.
patent: 3985132 (1976-10-01), Boyce et al.
patent: 4300549 (1981-11-01), Parker
patent: 4688566 (1987-08-01), Boyce
patent: 5699791 (1997-12-01), Sukiennik et al.
patent: 5724677 (1998-03-01), Bryant et al.
patent: 6332465 (2001-12-01), Xue et al.
patent: 6336459 (2002-01-01), Miyake et al.
patent: 6484722 (2002-11-01), Bostock et al.
Alpha Pro Tech Inc.
Bennett Henry
Bunin Andrew
Trexler, Bushnell Giangiorgi, Blackstone & Marr, Ltd.
LandOfFree
Filter mask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Filter mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Filter mask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3615353