Filter apparatus, exposure apparatus, and device-producing...

Details Filter apparatus, exposure apparatus, and device-producing... Filter apparatus, exposure apparatus, and device-producing...

2005-12-02

2008-08-26

Smith, Duane (Department: 1797)

Gas separation

With means facilitating transportability or handling of...

C055S467000, C055S471000, C055S472000, C055S473000, C055S485000, C055S486000, C055S350100, C055S385200, C055SDIG034, C095S287000, C095S288000, C096S417000, C096S223000, C454S187000, C219S400000, C600S021000

Reexamination Certificate

active

07416574

ABSTRACT:
A filter apparatus for improving gas temperature stability while maintaining a high impurity removal capacity. The filter apparatus includes a filter for removing impurities from a gas and a temperature adjuster for adjusting the temperature of the gas to a predetermined temperature. The filter apparatus further includes a humidity detector, arranged at the upstream side of the filter, for adjusting the humidity of the gas before the gas passes through the filter.

REFERENCES:
patent: 3505989 (1970-04-01), Truhan
patent: 3963461 (1976-06-01), Stockford et al.
patent: 5090972 (1992-02-01), Eller et al.
patent: 5591244 (1997-01-01), Vross et al.
patent: 5942017 (1999-08-01), Van Winkle, Sr.
patent: 6146451 (2000-11-01), Sakata et al.
patent: 6762820 (2004-07-01), Udagawa
patent: 6979359 (2005-12-01), Laiti
patent: 2005/0108996 (2005-05-01), Latham et al.
patent: 2005/0115213 (2005-06-01), Lim et al.
patent: 2005/0268581 (2005-12-01), Nakano et al.
patent: 9-145112 (1997-06-01), None
patent: 9-145112 (1997-06-01), None
patent: 9-273787 (1997-10-01), None
patent: 9-273787 (1997-10-01), None
patent: 2001-46822 (2001-02-01), None
patent: 2001-46822 (2001-02-01), None
patent: 2002-158170 (2002-05-01), None
patent: 02053267 (2002-07-01), None
patent: WO 02/53267 (2002-07-01), None
patent: WO 02/053267 (2002-07-01), None

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