Filter

Details Filter Filter

1995-06-19

1997-05-27

Powell, William

Etching a substrate: processes

Masking of a substrate using material resistant to an etchant

216 97, B44C 122

Patent

active

056329091

ABSTRACT:
A full duplex radio having improved properties is obtained by using asymmetric surface acoustic wave (SAW) filters, the filters are composed of series and parallel coupled SAW resonators. Asymmetry is obtained by covering either of the series or parallel resonators of each filter with a dielectric layer to increase the SAW coupling coefficient of the covered resonators relative to the uncovered resonators. The filters are desirably in pairs arranged with mirror image frequency asymmetry such that the steeper skirts of the frequency response are adjacent. Greater pass-bandwidths can be obtained without adverse affect on transmitter and receiver isolation.

REFERENCES:
patent: 5091051 (1992-02-01), Greer
patent: 5115216 (1992-05-01), Hikita et al.

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