Films for use in microelectronic devices and methods of producin

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427509, 427515, 428446, 428447, 428450, B32B 712

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active

061140325

ABSTRACT:
The present invention provides thin films for use in microelectronic devices. In one aspect, the present invention provides a copper diffusion barrier. In another aspect, the present invention provides a polymer film for various applications including use as a dielectric insulator and surface modification layers. Methods for the production of the films are also disclosed.

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