Film vapor deposition method

Details Film vapor deposition method Film vapor deposition method

2005-02-08

2005-02-08

Chen, Bret (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S250000, C427S255700, C427S597000

Reexamination Certificate

active

06852362

ABSTRACT:
A method of vapor depositing a film is provided wherein the film is not thermally damaged or broken due to the effects of heat and electrification of the film during the heating of a vapor deposition material. The film can be moved and vapor-deposited stably, and a loss of the film can be decreased as compared to the conventional method. The method forms a thin film on a long film, comprising aromatic polyamide, in vacuum. During the heating of the vapor deposition material, the long film stands still or is moved at a very low speed of 1 m/min or less, wherein a shielding plate is placed between the vapor deposition material and the long film. Once the vapor deposition material is completely molten, a substantial movement of the long film is started. At the same time or thereafter, the shielding plate is removed.

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patent: 5161233 (1992-11-01), Matsuo et al.
patent: 5496607 (1996-03-01), Inaba et al.
patent: 5731068 (1998-03-01), Mizunoya et al.

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