Film thickness measuring method of member to be processed...

Details Film thickness measuring method of member to be processed... Film thickness measuring method of member to be processed...

2007-06-07

2008-08-12

Connolly, Patrick J (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S451000

Reexamination Certificate

active

07411684

ABSTRACT:
A system including: a film thickness measuring apparatus for measuring a film thickness of a member to be processed, including: a differential waveform pattern data base for holding a standard pattern consisting of a time differential value of an interference light for each of multiple wavelengths with respect to a film thickness of a first member to be processed; a unit for measuring an intensity of an interference light for each of multiple wavelengths of a second member to be processed; a unit for obtaining a real pattern consisting of time differential values of measured interference light intensities; and a unit for determining a processed amount of the film by using a pattern of zero-cross points of the differential values of intensities of the received interference light for a second wavelength among the received interference lights of the multiple wavelengths.

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