Film thickness measuring method and apparatus

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer

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356351, G01B 902

Patent

active

061375756

ABSTRACT:
A method and apparatus for measuring the thickness of a film layer provided on a predetermined surface includes a step and device for detecting light reception signals of interference light of different wavelengths generated when light illuminates the film layer on the predetermined surface, a step or device for performing a first process for obtaining an approximate value for the film thickness by selecting a combination of solutions with the closest values from among solutions for the film thickness obtainable from at least three of the light reception signals corresponding to the respective wavelengths, and a step or device for performing a second process for obtaining an exact value for the film thickness by selecting a combination of solutions with the closest values from among solutions for the film thickness obtainable from all the light reception signals corresponding to the respective wavelengths. The second process is performed on the basis of the approximate value and with a restricted range for selection of the combination.

REFERENCES:
patent: 4850709 (1989-07-01), Ban et al.
patent: 5754294 (1998-05-01), Jones et al.
patent: 5856871 (1999-01-01), Cabib et al.

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