Film thickness measurement apparatus with tilting stage and meth

Details Film thickness measurement apparatus with tilting stage and meth Film thickness measurement apparatus with tilting stage and meth

1996-10-22

1998-03-17

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

G01B 902

Patent

active

057293430

ABSTRACT:
A film measurement apparatus having a stage with a support surface on which a substrate coated with a film may rest. An extended light source faces the stage, and an imager is aimed at the stage to capture the reflection of the light source. The imager includes a receiver upon which an image of at least an extended portion of the substrate may be generated, and a processor in communication with the imager is operable to calculate the thickness of the film at plurality of locations. The stage may be tilted to empirically measure an average illumination and the contrast between interference fringes, avoiding theoretical estimates provided by Fresnel'equation.

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"A novel micro-spot dielectric film thickness measurement system." Willenborg et al., SPIE Vol. 1594 Process Module Metrology, Control, and Clustering (1991) pp. 322-333.

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