Film-riding shaft seal formed from high-purity silicon nitride

Seal for a joint or juncture – Seal between relatively movable parts – Relatively rotatable radially extending sealing face member

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

277224, 277DIG6, 501 97, F16J 1520, C04B 3558

Patent

active

046934812

ABSTRACT:
An improved shaft seal for sealingly and rotatably mounting a torque-transmitting shaft within the pressurized housing of a pump. Generally, the shaft seal comprises a seal ring which is sealingly mounted within the housing, and a runner ring which is sealingly mounted around the shaft. Both the seal ring and the runner are preferably formed from 98% pure, hot-pressed silicon nitride. Additionally, the sealing surface of the seal ring is preferably radially tapered between about 635 and 645 microradians around its outer periphery, and between about 210 and 230 microradians around its inner periphery. The pressurized fluid within the housing enters the annular space between the two sealing surfaces and creates a flowing film of fluid upon which the two sealing surfaces may "ride" without frictionally engaging one another. The shaft seal of the invention is capable of operating in a film-riding mode despite broad variations in the pressure within the housing of the shaft, but is also capable of operating in a non-film-riding mode for long periods of time without damage, should the pump malfunction. The shaft seal finds particular application in the coolant pumps of nuclear steam generators.

REFERENCES:
patent: 1831411 (1931-11-01), Dietz
patent: 2814513 (1957-11-01), Kupfert et al.
patent: 3022685 (1962-02-01), Armacost
patent: 3093087 (1963-06-01), Hansen
patent: 3144362 (1964-08-01), Bradd
patent: 3199795 (1965-08-01), Bennett et al.
patent: 3347552 (1967-10-01), Frisch
patent: 3472701 (1969-10-01), Selover, Jr. et al.
patent: 3522948 (1970-08-01), MacCrum
patent: 3896009 (1975-07-01), Kobayashi et al.
patent: 4021136 (1977-05-01), Sabino, Jr.
patent: 4106782 (1978-08-01), Hyde et al.
patent: 4148494 (1979-04-01), Zelahy et al.
patent: 4205858 (1980-06-01), Shimazaki et al.
patent: 4226429 (1980-10-01), Sato et al.
patent: 4264547 (1981-04-01), de Pous
patent: 4376742 (1983-03-01), Mah
patent: 4386969 (1983-06-01), Kilbert
patent: 4391450 (1983-07-01), Beck
patent: 4407512 (1983-10-01), Trytek
patent: 4411594 (1983-10-01), Pellow et al.
patent: 4415168 (1983-11-01), Takenaka et al.
Powder Metallurgy, 1961, No. 8, "Dense Silicon Nitride", by G. G. Deeley et al, pp. 145-151.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Film-riding shaft seal formed from high-purity silicon nitride does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film-riding shaft seal formed from high-purity silicon nitride, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film-riding shaft seal formed from high-purity silicon nitride will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1380183

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.