Film resistor for flow measuring apparatus

Stock material or miscellaneous articles – Structurally defined web or sheet – Discontinuous or differential coating – impregnation or bond

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

428635, 428901, 317 59, 317 67, 317 71, B05D 100, H01L 2904

Patent

active

047057130

ABSTRACT:
A film resistor for a flow measuring apparatus including: a substrate; a first insulating layer on the substrate; a platinum (Pt) pattern on the first insulating layer; and a second insulating layer on the platinum pattern. A titanium dioxide (TiO.sub.2) layer is provided between each of the first and second insulating layers and the platinum pattern.

REFERENCES:
patent: 4320655 (1982-03-01), Kammermaier et al.
patent: 4345465 (1982-08-01), Gruner et al.
patent: 4533605 (1985-08-01), Hoffman
patent: 4536435 (1985-08-01), Utsumi et al.
patent: 4567542 (1986-01-01), Shimada et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Film resistor for flow measuring apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film resistor for flow measuring apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film resistor for flow measuring apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1067403

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.