Film quality inspecting method and film quality inspecting...

Details Film quality inspecting method and film quality inspecting... Film quality inspecting method and film quality inspecting...

2005-12-13

2005-12-13

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

Crystal or gem examination

C356S445000

Reexamination Certificate

active

06975386

ABSTRACT:
A film quality inspecting method comprising applying a measuring beam having a specific wavelength to an annealed silicon film formed on a substrate in a direction inclined with respect to the silicon film, measuring a reflection intensity or reflectivity of a reflection beam reflected by the silicon film as a result of the application, and inspecting a film quality of the silicon film based on a measurement value obtained by the measurement.

REFERENCES:
patent: 5898181 (1999-04-01), Vurens
patent: 5982482 (1999-11-01), Nelson et al.
patent: 6195163 (2001-02-01), Thakur et al.
patent: 6218198 (2001-04-01), Imao et al.
patent: 0660076 (1995-06-01), None
patent: 3-97219 (1991-04-01), None
patent: 6-224276 (1994-08-01), None
patent: 6-244255 (1994-09-01), None
patent: 8-51078 (1996-02-01), None
patent: 10294346 (1998-11-01), None
patent: 11-121378 (1999-04-01), None
patent: 11-274093 (1999-10-01), None
patent: 2000021943 (2000-01-01), None
patent: 2000-133614 (2000-05-01), None
patent: 2000292128 (2000-10-01), None
patent: 2001-110864 (2001-04-01), None

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