Film pattern producing method, and producing method for...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material

Reexamination Certificate

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Reexamination Certificate

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07547620

ABSTRACT:
A method for producing a film pattern comprises a step of forming a resin film on a substrate surface; a step of incorporating into the resin film a constituent of a conductive film or a semiconductor film; a step of irradiating the resin film with an ultraviolet light; and a step of heating the resin film at a temperature not lower than a decomposition temperature of the resin to form a conductive film or a semiconductor film on the substrate, whereby the resin does not easily generate decomposition residues to improve precision and quality of the produced film pattern.

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Translation of JPP 2000-243254, published Sep. 8, 2000.

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