Film mapping system

Optics: measuring and testing – Dimension – Thickness

Reexamination Certificate

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C356S445000, C356S237100

Reexamination Certificate

active

10889359

ABSTRACT:
A materials properties measuring system for using electromagnetic radiation interactions with selected materials positioned at a measuring location to determine selected properties thereof having an electromagnetic radiation source along with a plurality of radiation convergence elements for receiving any incident beams of electromagnetic radiation including the source having corresponding selected cross sections substantially perpendicular to the input path, and for converging these incident beams into corresponding departing beams including to the selected material each having a selected cross section substantially perpendicular to the output path that is smaller than that of its corresponding incident beam, and transmitting them to a beamsplitter that has an area as great as any such element. An electromagnetic radiation receiver is provided to receive any beams of electromagnetic radiation incident thereon after propagating thereto from the beamsplitter.The electromagnetic radiation source for providing propagating selected electromagnetic radiation at an output thereof is formed by a plurality of electromagnetic radiation emitters with differing center emission wavelengths and a beam combiner is provided with them wherein any electromagnetic radiation emitted by any of said electromagnetic radiation emitters enters at differing points to follow at least in part a common optical path to an output through at least some portion of the combiner determined by reflections and transmissions thereof in and at the combiner.

REFERENCES:
patent: 3798450 (1974-03-01), Reynolds et al.
patent: 4264205 (1981-04-01), Landa
patent: 5020909 (1991-06-01), Landa
patent: 5068749 (1991-11-01), Patel
patent: 5351117 (1994-09-01), Stewart et al.
patent: 5475221 (1995-12-01), Wang
patent: 5523846 (1996-06-01), Haga
patent: 5719024 (1998-02-01), Cabib et al.
patent: 5822060 (1998-10-01), Linowski et al.
patent: 6075591 (2000-06-01), Vokhmin
patent: 6167171 (2000-12-01), Grasis et al.
patent: 6373568 (2002-04-01), Miller et al.
patent: 6654132 (2003-11-01), Schietinger et al.
patent: 2002/0015148 (2002-02-01), Tomomatsu
patent: 2003/0030801 (2003-02-01), Levenson et al.
patent: 2004/0246493 (2004-12-01), Kim et al.

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