Film growth system and method for spherical-shaped semiconductor

Details Film growth system and method for spherical-shaped semiconductor Film growth system and method for spherical-shaped semiconductor

1998-04-29

2000-01-18

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

156345, 118725, C23C 1600

Patent

active

060154640

ABSTRACT:
An apparatus and method for depositing thin films on the surface of a device such as a spherical shaped devices. The apparatus includes an enclosure containing a plurality of apertures and a conductor coil. The apertures connect to conduits for inputting and outputting the devices as well as injecting and releasing different gases and/or processing constituents. A chamber is formed within the enclosure and is configured to be coaxial with the conductor coil. Devices move through the input conduit where they are preheated by a resistance-type furnace. The preheated devices then move into the chamber where they are further heated by radio frequency energy from the conductor coil. At this time, the gases and/or processing constituents react with the heated device thereby growing a thin film on its outer surface.

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