Film forming system using high frequency power and power supply

Details Film forming system using high frequency power and power supply Film forming system using high frequency power and power supply

1990-09-24

1992-05-26

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429803, 20429834, 118723, C23C 1434, C23C 1454

Patent

active

051164825

ABSTRACT:
A film forming system including an evacuating unit, a pair of opposed electrodes and an RF voltage supplying unit for suppling RF voltages to the respective electrodes to generate a discharge between the electrodes to form a film. The film forming system includes: a discharge variation detecting unit for detecting an amount of a variation in the discharge as a voltage from each of the electrodes; and a phase adjusting unit for detecting the difference in phase between the RF voltages supplied to the electrodes, and for adjusting the phase difference of the RF voltages supplied to the electrodes, according to the difference between the detected phase difference and a preset value.

REFERENCES:
A. Halperin et al, J. Vac. Sci. Technol., vol. 15, No. 1, pp. 116-118 (1978).

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