Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1982-08-27
1983-09-13
Edmundson, F.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
136261, 427 39, 427 86, 42218604, C23C 1308, C23C 1100, H01L 3115
Patent
active
044040768
ABSTRACT:
A film forming process comprising introducing gas for forming a film from an inlet part for gas into a pressure-reducible deposition chamber wherein a substrate for forming a film thereon is supported by a fixing member, at least one of said substrate and fixing member are used so as to act as a first electrode, at least one portion of the wall of said deposition chamber is employed so as to act as a second electrode, the surface of said second electrode is arranged substantially in parallel to the surface for forming a film thereon, of said substrate, and said inlet part for gas and an outlet part for gas are arranged substantially in the positional relationship of rotation symmetry; and generating a glow discharge in said deposition chamber, thereby forming a film on said substrate.
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Robertson, J. Electrochem. Soc., vol. 122, No. 6, pp. 796-800, Jun. 1975.
Fukada Tadaji
Nakagawa Katsumi
Canon Kabushiki Kaisha
Edmundson F.
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