Film forming method, film forming apparatus, method of...

Coating processes – Optical element produced

Reexamination Certificate

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Details

C427S168000, C118S682000, C118S305000, C118S323000, C118S696000

Reexamination Certificate

active

07422768

ABSTRACT:
The invention provides a film forming method that improves throughput in a preliminary discharge. The film forming method according to the present invention can include a preliminary discharge step of preliminarily discharging liquid droplets from a head and a liquid droplet discharge step of relatively moving the head and the work to discharge the liquid droplets onto the surface of the work from the head. The preliminary discharge of the liquid droplets is carried out while the head and the work are moved relative to each other.

REFERENCES:
patent: 5772764 (1998-06-01), Akimoto
patent: 6084650 (2000-07-01), Sekiguchi
patent: 6508528 (2003-01-01), Fujii et al.
patent: 6660332 (2003-12-01), Kawase et al.
patent: 2006/0216744 (2006-09-01), Chu
patent: 1267598 (2000-09-01), None
patent: 1358626 (2002-07-01), None
patent: 1 168 407 (2002-01-01), None
patent: A 2001-180007 (2001-07-01), None
patent: A 2002-67346 (2002-03-01), None

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