Film forming method and producing method for electron source...

Coating processes – Electrical product produced – Electron emissive or suppressive

Reexamination Certificate

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Reexamination Certificate

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08075944

ABSTRACT:
In case of forming films in plural positions with an ink jet head having plural nozzles, to provide a method of efficiently correcting an aberration in the liquid droplet applying position resulting for example from a distortion of a substrate, thereby producing an electron source with a high production yield. Positions of device electrodes2, 3on the electron source substrate1are detected by fetching in advance a surface image of the substrate1, then a position of an electroconductive film4is calculated as a liquid droplet applying position, and an inclination angle θ of the ink jet head11is so regulated that a pitch of the nozzles12matches a pitch d of the obtained liquid droplet applying positions.

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Chinese Office Action dated Nov. 30, 2007, regarding Application No. 2006100716746.

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