Film forming method and film forming apparatus

Details Film forming method and film forming apparatus Film forming method and film forming apparatus

2011-03-01

2011-03-01

Turocy, David (Department: 1715)

Coating processes

Interior of hollow article coating

Coating by vapor, gas, mist, or smoke

C427S248100, C427S255270, C427S255393

Reexamination Certificate

active

07897205

ABSTRACT:
A film forming method is characterized in that the method is provided with a step of introducing a processing gas including inorganic silane gas into a processing chamber, in which a mounting table composed of ceramics including a metal oxide is arranged, and precoating an inner wall of the processing chamber including a surface of the mounting table with a silicon-containing nonmetal thin film; a step of mounting a substrate to be processed on the mounting table precoated with the nonmetal thin film; and a step of introducing a processing gas including organic silane gas into the processing chamber, and forming a silicon-containing nonmetal thin film on a surface of the substrate mounted on the mounting table.

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