Film forming method and apparatus therefor

Details Film forming method and apparatus therefor Film forming method and apparatus therefor

1997-01-10

1999-01-12

Pianalto, Bernard

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

118712, 118723CB, 427209, 4272481, 427294, 427523, 427569, B05D 100

Patent

active

058584501

ABSTRACT:
In formation of thin films on both surfaces of a substrate such as a lens or the like, a pair of cluster beam evaporation sources are provided in mutually separate manner in a film forming chamber. The substrate is disposed between the pair of cluster beam evaporation sources. The cluster beam evaporation source includes a crucible which is arranged to be inclined toward the substrate, or which has a nozzle on a lateral face opposed to the substrate.

REFERENCES:
patent: 4629640 (1986-12-01), Akao
patent: 4687939 (1987-08-01), Miyauchi et al.
patent: 4688130 (1987-08-01), Nakanouchi et al.
patent: 4799454 (1989-01-01), Ito
patent: 4882023 (1989-11-01), Wendman
patent: 5079224 (1992-01-01), Higuchi
patent: 5211994 (1993-05-01), Tsukazaki et al.
patent: 5340415 (1994-08-01), Koike et al.
patent: 5525158 (1996-06-01), Tsukazaki et al.

Affiliated with

Also associated with

Rating

Film forming method and apparatus therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film forming method and apparatus therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film forming method and apparatus therefor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1512481