Film-forming device with a substrate rotating mechanism

Details Film-forming device with a substrate rotating mechanism Film-forming device with a substrate rotating mechanism

2005-01-04

2005-01-04

Mills, Gregory (Department: 1763)

Coating apparatus

Gas or vapor deposition

Work support

C156S345550, C204S298270

Reexamination Certificate

active

06837940

ABSTRACT:
A film-forming device with a substrate rotating mechanism includes a susceptor30in the form of a circular disk; a base plate6positioned below the susceptor30and rotatably retaining the susceptor30; a revolution generating section5rotating the susceptor30at the outer periphery of the susceptor30; a plurality of substrate tray retaining sections23arranged on the susceptor30; a plurality of annular substrate trays20rotatably supported in the corresponding substrate tray retaining sections23; a rotation generating section4rotating the substrate trays20; and a plurality of substrates W retained in the substrate trays20. The substrates W are revolved by the rotation of the susceptor30and rotated by the rotation of the substrate trays20to apply a certain film-forming process. The substrates W are rotated and revolved by one or more revolution generating section5and the rotation generating section4.

REFERENCES:
patent: 3783822 (1974-01-01), Wollam
patent: 5343938 (1994-09-01), Schmidt
patent: 03069119 (1991-03-01), None
patent: 03171616 (1991-07-01), None

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