Film forming apparatus, manufacturing management system and...

Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to condition of coating material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S666000, C118S667000, C118S708000, C118S052000, C118S056000, C118S319000, C118S320000, C702S081000, C702S082000, C702S084000

Reexamination Certificate

active

07638001

ABSTRACT:
A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.

REFERENCES:
patent: 5322706 (1994-06-01), Merkel et al.
patent: 5408405 (1995-04-01), Mozumder et al.
patent: 6004047 (1999-12-01), Akimoto et al.
patent: 6445969 (2002-09-01), Kenney et al.
patent: 6466881 (2002-10-01), Shih et al.
patent: 6712956 (2004-03-01), Kim
patent: 2004/0045623 (2004-03-01), Parker et al.
patent: 2004/0253737 (2004-12-01), Haberland et al.
patent: 61-061164 (1986-03-01), None
patent: 02-137028 (1990-11-01), None
patent: 05-312747 (1993-11-01), None
patent: 2003-266006 (2003-09-01), None
Notification of Reasons for Rejection, mailed Mar. 27, 2009, from the Japan Patent Office in Japanese Patent Application No. 2004-138378, and English language translation thereof.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Film forming apparatus, manufacturing management system and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film forming apparatus, manufacturing management system and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film forming apparatus, manufacturing management system and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4135321

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.