Coating apparatus – With heat exchange – drying – or non-coating gas or vapor... – Plural treatments
Reexamination Certificate
2006-02-28
2006-02-28
Lamb, Brenda A. (Department: 1734)
Coating apparatus
With heat exchange, drying, or non-coating gas or vapor...
Plural treatments
C118S070000
Reexamination Certificate
active
07005009
ABSTRACT:
The object of the present invention is to provide an apparatus suitable for forming a thick film having a thickness on a surface of a substrate such as a glass substrate, a semiconductor wafer or the like. In the apparatus according to the present invention, a stock station for a substrate and a treatment station for a substrate are adjacent to each other, portions for coating, film-forming, cleaning and drying are provided in the treatment station, a tray having a concave portion for accommodating a substrate defined on the surface thereof is provided, and a transfer device circulates the tray around the portions for coating, film-forming, cleaning and drying.
REFERENCES:
patent: 4418639 (1983-12-01), Wills et al.
patent: 5099782 (1992-03-01), Nakazawa et al.
patent: 5266113 (1993-11-01), Konno
patent: 6395335 (2002-05-01), Onishi et al.
Aoki Taiichiro
Obata Hitoshi
Ohishi Seiji
Yamabe Hiroshi
Blackman William D.
Carrier Joseph P.
Carrier Blackman & Associates P.C.
Lamb Brenda A.
Tazmo Co., Ltd.
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