Film forming apparatus capable of preventing adhesion of film de

Details Film forming apparatus capable of preventing adhesion of film de Film forming apparatus capable of preventing adhesion of film de

1991-03-25

1991-11-19

Beck, Shrive

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118724, 118733, 20429811, 20429825, C23C 1600

Patent

active

050656988

ABSTRACT:
A film forming apparatus for forming a film on a substrate set inside a film forming chamber capable of being evacuated comprises; a film forming chanber in which a film is formed on a substrate; a deposit shield member to prevent deposits from being adhered on the inner wall surface of the film forming chamber; a vacuum chamber capable of being evacuated and in which the deposit shield member is changed for new one; an open-shut device provided between the vacuum chamber and the film forming chamber, to keep airtightness between the vacuum chamber and the film forming chamber; and a carrying device to carry the deposit shield member between the vacuum chamber and the film forming chamber.

REFERENCES:
patent: 3656454 (1972-04-01), Schrader
patent: 4666734 (1987-05-01), Kamiya et al.
patent: 4696833 (1987-09-01), Monnig et al.
patent: 4699805 (1987-10-01), Seelbach et al.
patent: 4763602 (1988-08-01), Madan et al.
patent: 4824545 (1989-04-01), Arnold et al.
patent: 4825808 (1989-05-01), Takahashi et al.

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