Coating processes – Centrifugal force utilized
Reexamination Certificate
2006-03-14
2006-03-14
Cameron, Erma (Department: 1762)
Coating processes
Centrifugal force utilized
C427S407100, C427S419700, C427S425000
Reexamination Certificate
active
07011864
ABSTRACT:
An apparatus for forming a film on a wafer comprising, a first coating apparatus coating a foaming insulation film material on the wafer, a second coating apparatus coating a non-porous insulation film material on the wafer, a low oxygen heating temperature regulating process apparatus performing a heating process on the wafer on which the foaming insulation film material is coated, a low oxygen high temperature heating process apparatus performing the heating process on the water on which the non-foaming insulation film material is coated, a transfer mechanism transferring the wafer to these apparatuses, and a selecting means selecting a path to which the wafer is transferred corresponding to the film formed on the wafer.
REFERENCES:
patent: 5371037 (1994-12-01), Yonehara
patent: 5393712 (1995-02-01), Rostoker et al.
patent: 5750000 (1998-05-01), Yonehara et al.
patent: 6246030 (2001-06-01), Matsuyama
patent: 6248168 (2001-06-01), Takeshita et al.
patent: 6306729 (2001-10-01), Sakaguchi et al.
patent: 6351039 (2002-02-01), Jin et al.
patent: 6365228 (2002-04-01), Tsai et al.
patent: 6603204 (2003-08-01), Gates et al.
patent: 6677680 (2004-01-01), Gates et al.
patent: 2002/0177298 (2002-11-01), Konishi et al.
Cameron Erma
Rader & Fishman & Grauer, PLLC
Tokyo Electron Limited
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