Film-forming apparatus and film-forming method

Details Film-forming apparatus and film-forming method Film-forming apparatus and film-forming method

1997-03-11

1999-08-10

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723MA, 118718, H05H 100

Patent

active

059353350

ABSTRACT:
A film-forming apparatus for making it possible to form a thin film on a web-like high-molecular film substrate, comprising: a vacuum chamber provided with an evacuator; a gas introducing member for introducing a thin-film-forming gas into the vacuum chamber; a plasma generating member for generating plasma in the vacuum chamber; a substrate carrying member for carrying the substrate to the neighborhood of the plasma generated by the plasma generating member; and a bias voltage applying member for applying a desired bias voltage to the substrate. The plasma generating member is constituted by a microwave ECR plasma generating member including a microwave generating member for generating microwave, a microwave introducing and propagating member for coaxially introducing the generated microwave into the vacuum chamber and radially propagating the microwave in the vacuum chamber, and permanent magnets provided in the vacuum chamber for forming a magnetic field to cause electron cyclotron resonance with the introduced and propagated microwave.

REFERENCES:
patent: 5021114 (1991-06-01), Saito et al.
patent: 5034086 (1991-07-01), Sato
patent: 5232791 (1993-08-01), Kohler et al.
patent: 5360483 (1994-11-01), Kurokawa et al.
patent: 5466295 (1995-11-01), Getty
patent: 5523126 (1996-06-01), Sano et al.

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