Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-06-27
1998-01-27
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118728, C23C 1600
Patent
active
057118159
ABSTRACT:
A film forming apparatus includes: a chamber for housing a semiconductor wafer having a surface on which a film is to be formed, and performing a film formation process with respect to the semiconductor wafer; a process gas supply system for supplying a process gas for forming the film onto the surface of the semiconductor wafer on which the film is to be formed; a heater for heating the semiconductor wafer to decompose a film forming gas, thereby forming the film on the wafer; a purge gas supply system for supplying a purge gas from a lower surface side of the surface of the semiconductor wafer on which the film is to be formed toward a peripheral edge portion of the semiconductor wafer; and a ring member positioned at a position to cover a peripheral edge portion of the surface on which the film is to be formed when film formation is to be performed with respect to the semiconductor wafer, the ring member having an outer edge projecting from an outer edge of the target object in the film formation. A flow path in which substantially all the purge gas flows outward from the target object is formed by the ring member.
REFERENCES:
patent: 5000113 (1991-03-01), Wang
patent: 5447570 (1995-09-01), Schmitz
patent: 5534072 (1996-07-01), Mizuno
Lee Hideki
Yonenaga Tomihiro
Bueker Richard
Tokyo Electron Limited
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