Film forming apparatus

Details Film forming apparatus Film forming apparatus

1996-10-29

1999-07-20

Bueker, Richard

Coating apparatus

Gas or vapor deposition

C23C 1600

Patent

active

059251883

ABSTRACT:
A main gas inlet pipe is provided in the vicinity of the bottom of a reaction tube, from which main gas inlet pipe is supplied a monosilane gas and a phosphine gas. A first and a second sub-gas inlet pipes also are provided, having their extreme ends opened, the sub-gas inlet pipes being provided with gas blowout holes on the proximal end somewhat from the extreme end thereof. With this arrangement, a decreasing level of gas from the main gas inlet pipe is compensated for by the gas supplied from extreme end openings of the sub-gas inlet pipes, and a further compensated for by the gas from the gas blowout holes.

REFERENCES:
patent: 4096822 (1978-06-01), Yamawaki
patent: 5029554 (1991-07-01), Miyashita
patent: 5252133 (1993-10-01), Miyazaki
patent: 5622566 (1997-04-01), Hosaka

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