Film forming apparatus

Details Film forming apparatus Film forming apparatus

1987-07-17

1989-05-02

Pianalto, Bernard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723, 118725, 118729, C23C 1600

Patent

active

048258067

ABSTRACT:
A process for forming a film, characterized in that, in forming a film by glow discharge decomposition, one or more electrode pair rows each consisting of a plurality of high frequency electrode pairs are arranged in a line and in parallel and substrates are arranged on both sides of said electrode pair row approximately in parallel to the electrode pair row. According to the process, damage of the film due to plasma can be reduced, a shield on the back of the RF electrode is not needed, and a film of a large area can be obtained.

REFERENCES:
patent: 4513022 (1985-04-01), Jansen et al.

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