Film forming apparatus

Coating apparatus – Gas or vapor deposition – With treating means

Patent

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Details

118729, 118732, C23C 1650

Patent

active

047198737

ABSTRACT:
A film forming apparatus utilizing discharge to accomplish film formation is provided with a cover electrode movable back and forth and a gas supply pipe. By moving the cover electrode, the cover electrode and a substrate containing cassette in which a substrate for film formation is contained and which is conveyed to a predetermined film forming position are electrically connected, and discharge is caused in the substrate containing cassette.

REFERENCES:
patent: 4593644 (1986-06-01), Hanak

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