Film formation process

Details Film formation process Film formation process

1988-09-09

1990-03-20

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 427 39, 427 451, 427 47, B05D 306

Patent

active

049100416

ABSTRACT:
A process of forming a film on a substrate, which comprises bringing a substrate into contact with a plasma zone formed by generating, by use of a discharge electrode or discharge electrodes, high temperature or quasi-high temperature plasma of a gas containing at least one carbon containing compound,
wherein said electrode comprises a sheet-like electrode provided with a slit having a linear portion and connected to a microwave electric source; or
wherein said plasma zone is formed by forcing a high temperature or quasi-high temperature plasma generated in an arc between said electrodes by DC discharge, to move by applying a magnetic field. The process enables formation of films on substrate surfaces in a high energy efficiency.

REFERENCES:
patent: 4816113 (1989-03-01), Yamazaki

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