Film formation apparatus

Details Film formation apparatus Film formation apparatus

2008-06-17

2008-06-17

Cleveland, Michael (Department: 1792)

Coating apparatus

Gas or vapor deposition

Work support

C118S719000, C118S724000, C118S715000, C118S725000

Reexamination Certificate

active

07387686

ABSTRACT:
A metal atomic layer and an oxygen atomic layer are formed in this order by ALD, followed by rapid heating through RTA (Rapid Thermal Annealing). This cycle of steps is repeated to form a high dielectric constant film.

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