Film dissolution method of dissolving silica-based coating film

Details Film dissolution method of dissolving silica-based coating film Film dissolution method of dissolving silica-based coating film

1997-02-12

1998-07-14

Kunemund, Robert

Etching a substrate: processes

Nongaseous phase etching of substrate

Projecting etchant against a moving substrate or controlling...

216 97, 216 99, 134 13, B44C 122, B08B 600

Patent

active

057799288

ABSTRACT:
A film dissolving liquid is ejected from a needle-shaped nozzle onto a peripheral edge portion of a substrate surface of a SOG film, while being subjected to the film dissolving liquid. The substrate is rotated in order to dissolve and remove the SOG film from the peripheral edge portion of the substrate. The film dissolving liquid is a solvent or mixture of two or more solvents selected from the group cyclohexanone, .gamma.-butyrolactone, ethyl lactate or ethyl pyruvate. As a result, a swelling of the SOG film is not created at the edge portion of the substrate. A crack is not therefore created at the edge portion of the SOG film, and generation of particles due to a damage at the film swelling portion thereof is prevented.

REFERENCES:
patent: 4011351 (1977-03-01), Gipstein et al.
patent: 5328871 (1994-07-01), Tanigawa et al.
"Corrosion of Silica Glass by Aqueous Solutions of Organic Compounds"; Rybarikova et al.; abstract only; Ceram.-Silik (1996), 40(3).

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