Film deposition system

Stock material or miscellaneous articles – Surface property or characteristic of web – sheet or block

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427 38, 118620, 118621, 118726, B05D 306, B32B 1500

Patent

active

049025724

ABSTRACT:
A film deposition system is provided for depositing a film of at least first and second materials onto a common target. This system includes a housing within which the common target is located and within which a high vacuum region may be formed. The system further includes first and second crucibles each containing respective first and second materials to be deposited; a heating element and/or cooling element for vaporizing the materials in each of the first and second crucibles, respectively; first and second nozzles for ejecting the vaporized material from the first and second crucibles into the high vacuum region to form non-ionized atomic clusters by adiabatic expansion with those clusters traveling in first and second directions, respectively, each of which are non-coincident with the common target; first and second electron strippers for converting a portion of those non-ionized clusters to ionize clusters of the first and second materials; first and second accelerators for accelerating the ionized clusters of the first and second materials; and first and second deflectors for deflecting the ionized clusters of first and second materials to third and fourth directions, respectively, each of which are coincident with the common target. By varying the percentage of non-ionized atomic clusters converted to ionized clusters, the rate of flow of the ionized clusters deposited upon the common material may be effectively instantaneously controlled to thereby deposit a film having a continuous and smoothly varying property.

REFERENCES:
patent: 3566829 (1971-03-01), Hill
patent: 3583361 (1971-06-01), Laudel, Jr.
patent: 3974059 (1976-08-01), Murayama
patent: 4082636 (1978-04-01), Takagi
patent: 4197814 (1980-04-01), Takagi et al.
patent: 4217855 (1980-08-01), Takagi
patent: 4286545 (1981-09-01), Takagi et al.
patent: 4342631 (1982-08-01), White et al.
patent: 4451499 (1984-05-01), Morimoto et al.
patent: 4559096 (1985-12-01), Friedman et al.
patent: 4559901 (1985-12-01), Morimoto et al.
patent: 4676194 (1987-06-01), Satou et al.
patent: 4685976 (1987-08-01), Schachameyer et al.
patent: 4686022 (1987-08-01), Rempt
patent: 4724106 (1988-02-01), Morimoto et al.
patent: 4740267 (1988-04-01), Knauer et al.
T. Takagi et al., "New Developments in Ionized-Cluster Beam and Reactive Ionized-Cluster Beam Deposition Techniques," Thin Solid Films, 63, pp. 41-51, 1979.
Hagena et al., "Formation and Detection of High-Energy Cluster Beam," Rarefied Gas Dynamics, vol. 51, Part II, Progress in Astronautics and Aeronautics, Technical paper selected from the 10th International Symposium on Rarefied Gas Dynamics, Jul. 1976.

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